EUV-IL technology of Eulitha has a world-leading resolution of 11 nm.

Eulitha produces high-quality nanostructures using advanced lithography techniques. The resolution of the structures it offers extends down to sub-20 nm region.

Eulitha's fabrication for periodic nanostructures is based on its record-breaking Extreme Ultraviolet Interference lithography EUV-IL technology. The method uses light at a wavelength of about 13 nm. One-dimensional linear gratings and two-dimensional dot arrays or grids are available from EUV-IL.

In addition, Eulitha has state of the art electron-beam lithography capability to manufacture arbitrary nanostructures for a variety of applications.

Eulitha aims to provide the best quality periodic nanostructures required both by the industry and research and development community. Contact us to find out how your application may benefit from our unique products.