• leading-expertise-in-nano-lithography_01

    Leading expertise in nano-lithography

  • custom-nano-made-patterns_01

    Custom nano-patterning High resolution and fidelity

  • photonic-nanoimprint

    Photonic nanoimprint templates Large area structures made by PHABLE™ technology

  • new-full-field-exposure

    PhableR 100 - New exposure system Resolution of a stepper - Simplicity of a mask aligner

Next generation nano patterning

Eulitha provides nano-patterning services and equipment for applications in photonics, electronics, optoelectronics, displays, biotechnology and other areas. Its proprietary PHABLE™ technology enables low-cost production of periodic structures over large-areas with a non-contact exposure system. Eulitha also offers solutions based on state-of-the-art e-beam and EUV-IL lithography technologies.

PSS NPSS equipment

PhableR 100

Unique full-field exposure system for non-contact patterning of wafers

euv gratings

EUV gratings

Gratings on thin membranes for lithography and spectroscopy

PhableR 100 - Revolutionary high resolution photolithography system

  • Full-field exposure on 4” wafers
  • Practically unlimited depth-of-focus
  • High resolution: 150nm half-pitch or below
  • Uniform printing on non-flat substrates (e.g. epi-wafers)
  • Non-contact: protects masks from damage and contamination
  • Linear gratings, photonic crystal patterns and other periodic structures
    Learn more about PhableR 100


Eulitha receives order from CIOMP institute in China

Eulitha receives order for PHABLE Photolithography System from Changchun Institute of Optics, Fine Mechanics and Physics (CIOMP)

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