• leading-expertise-in-nano-lithography_01

    Leading expertise in nano-lithography

  • custom-nano-made-patterns_01

    Custom nano-patterning High resolution and fidelity

  • photonic-nanoimprint

    Photonic nanoimprint templates Large area structures made by PHABLE™ technology

  • new-full-field-exposure

    PhableR 100 - New exposure system Resolution of a stepper - Simplicity of a mask aligner

Next generation nano patterning

Eulitha provides nano-patterning services and equipment for applications in photonics, electronics, optoelectronics, displays, biotechnology and other areas. Its proprietary PHABLE™ technology enables low-cost production of periodic structures over large-areas with a non-contact exposure system. Eulitha also offers solutions based on state-of-the-art e-beam and EUV-IL lithography technologies.

PSS NPSS equipment

PhableR 100

Unique full-field exposure system for non-contact patterning of wafers

euv gratings

EUV gratings

Gratings on thin membranes for lithography and spectroscopy

PhableR 100 - Revolutionary high resolution photolithography system

  • Full-field exposure on 4” wafers
  • Practically unlimited depth-of-focus
  • High resolution: 150nm half-pitch or below
  • Uniform printing on non-flat substrates (e.g. epi-wafers)
  • Non-contact: protects masks from damage and contamination
  • Linear gratings, photonic crystal patterns and other periodic structures
    Learn more about PhableR 100

News And Upcoming Events

ICNS-12

Eulitha will be joining the 12th International Conference on Nitride Semiconductors (ICNS) with a booth. ICNS will be held in Strasbourg, France between July 24 - 28, 2017.

Eulitha at the MNE Conference in Braga, Portugal

Eulitha will participate at this years Micro and Nano Engineering Conference in Braga, Portugal with an oral presentation and a booth in the exhibit. The conference will take place between September 18-22, 2017.