Eulitha is a pioneer and leader in production of high-quality nanostructures using advanced lithography techniques. We offer custom-made and standardized nanostructures with resolution extending down to sub-20 nm region.

Eulitha's fabrication for periodic nanostructures is based on its record-breaking Extreme Ultraviolet Interference lithography EUV-IL technology. The method uses light at a wavelength of about 13 nm. Eulitha fabricates one-dimensional linear gratings and two-dimensional dot arrays or grids by EUV-IL.

In addition, Eulitha has state of the art electron-beam lithography capability to manufacture arbitrary nanostructures for a variety of applications.

Contact us to find out how your application may benefit from our unique products, whether you are interested in nanoimprint templates, EUV gratings or custom designed patterns for your application. Our renowned scientific team will work with you to find the optimum solution taking into account both the requirements of your application and various nanofabrication options available.