Eulitha specializes in the manufacturing of periodic nanostructures with periodicity smaller than 100 nm. The EUV technology enables coverage of large areas with nanostructures. We have developed a standard line of 1D and 2D nanostructured products for R&D use. In addition to its high-resolution EUV products Eulitha provides patterns made with UV interference lithography and e-beam lithography.

Contact us for solutions to your patterning problems.

Nanoimprint Templates

You can bring the high-quality, high-resolution patterning capability of our unique EUV technology to your institution through EULITHA's nanoimprint templates. We offer templates etched in Si. Our standard templates with linear grating or 2D hole array type patterns bring you the quality and resolution of EUV lithography at an affordable price. Custom templates made with e-beam or EUV lithography over larger areas are available.

35 nm half-pitch pattern imprinted in PMMA resist with EULITHA's standard stamp -  imprint and image by Mirco Altana, INKA Institute.	Nanohole array with 35nm half-pitch.

Description	Field size	No of fields	Stamp size	Price (USD)
25 nm half-pitch linear NEW!	0.4mm x 0.4 mm	4	20mm x 20mm	2’400
35 nm half-pitch linear - Type A	1.2mm x 0.5 mm	4	20mm x 20mm	1’600
35 nm half-pitch linear - Type B	1.2mm x 0.5 mm	2	15mm x 15mm	1’400
45/50 nm half-pitch hole array	0.6mm x 0.6 mm	4	15mm x 15mm	1’900
35/37 nm half-pitch hole array	0.4mm x 0.4 mm	4	15mm x 15mm	2’400

Samples for patterned magnetic media research

Patterned magnetic media is a promising technology to overcome the super-paramagnetic limit that is expected to limit the data storage density on hard disks. However, high volume fabrication of periodic magnetic elements with the required properties such as resolution (pitch well below 50 nm) and dot-size and dot-spacing uniformity has remained a formidable challenge. EULITHA is developing the EUV technology to enable the production of patterned magnetic media. The technology has already shown patterning capability for data storage density over 1 Tbit/in² ( H. Solak et al, J. Vac. Sci. Technol. B 25, 2123, 2007 ).

In order to facilitate further development of the patterned magnetic media technology EULITHA offers research samples with 516 Gbit/in² and 358 Gbit/in² density. These samples for bit patterned media (BPM) represent unprecedented quality in nanostructuring in terms of a combination of resolution, and pattern uniformity. Patterns are available on Si or customer provided substrates. They are ideal for testing pattern transfer processes and read/write procedures and research on magnetic properties.

Download our brochure on BPM research samples

EUV Transmission Gratings

We offer EUV transmission diffraction gratings with periods down to 50 nm patterned on thin silicon or silicon nitride membranes. Our years of experience on EUV-IL has led to many improvements in the design and manufacturing of these high specialty devices. Our diffraction gratings are used in EUV spectroscopy and lithography setups. We provide help with optimum gratings design for your application. Contact us with your requirements.

Inspect some of our nanostructures

These are some of the nanostructures that we have produced using our EUV technology. Take a look and let us know if one of these can be a solution to your nano-patterning problem or if we can develop another one for you.