We offer EUV transmission diffraction gratings with periods down to 50 nm patterned on thin silicon or silicon nitride membranes. Our years of experience on EUV-IL have led to many improvements in the design and manufacturing of these high specialty devices. Our diffraction gratings are used in EUV spectroscopy and lithography setups. We provide help with optimum gratings design for your application.
Please indicate grating period, area and wavelength range in your inquiries for EUV gratings.
Please click on the link below for an article on research performed at the Shanghai Synchrotron Radiation Facility using EUV gratings produced by Eulitha. Large-scale uniform Au nanodisk arrays fabricated via x-ray interference lithography for reproducible and sensitive SERS substrate.