E-BEAM-MADE STANDARD PATTERNS

Standard e-beam made molds are provided on 20x20mm2 Si substrates. They offer combination of high-resolution and large enough area of 5x5mm2 for most uses at an affordable price. These templates are normally on stock and available for shipment.

Holes on Square Lattice
Product Period Area Feature Diameter / Height
P100s_h_5w5 100nm 5x5mm2 50nm / 100nm
P150s_h_5w5 150nm 5x5mm2 60nm / 100nm
P200s_h_5x5 200nm 5x5mm2 70nm / 100nm
Holes on Hexagonal Lattice
Product Period Area Feature Diameter / Height
P200h_h_5w5 200nm 5x5mm2 80nm / 100nm
P350h_h_5w5 300nm 5x5mm2 125nm / 100nm
P400h_h_5w5 400nm 5x5mm2 150nm / 100nm
Pillars on Square Lattice
Product Period Area Feature Diameter / Height
P100s_p_5w5 100nm 5x5mm2 50nm / 100nm
P150s_p_5w5 150nm 5x5mm2 60nm / 100nm
P200s_p_5w5 200nm 5x5mm2 80nm / 100nm
Pillars on Hexagonal Lattice
Product Period Area Feature Diameter / Height
P200h_p_5w5 200nm 5x5mm2 70nm / 100nm
P300h_p_5w5 300nm 5x5mm2 110nm / 100nm
P400h_p_5w5 400nm 5x5mm2 120nm / 100nm

Description

Layout of the molds
  • Feature size / height may vary from batch to batch
  • Inquire for available stock
  • Anti-adhesion coating available as an option
  • Converting in Nickel molds on request (NEW)

Applications

  • Magnetic nanostructures
  • LED Light extraction layers, photovoltaic patterning
  • Templates for crystal growth
  • Nanoimprint process development
  • Photonic / plasmonic structures

Examble structures

Silicon ebeam templates with Nanoholes pitch 100nm depth 100nm
Nanoholes - pitch 100nm - depth 100nm
Silicon ebeam template 100nm periode hole array on square lattice
Square lattice hole array - 100nm pitch
Ebeam made templates - Hexagonal hole array - 200nm pitch
Hexagonal hole array - 200nm pitch
Ebeam made template - Hexagonal pillar array - 200nm pitch
Hexagonal pillar array - 200nm pitch