PhableR 100
Unique full-field exposure system for non-contact patterning of wafers
Eulitha provides nano-patterning services and equipment for applications in photonics, electronics, optoelectronics, displays, biotechnology and other areas. Its proprietary PHABLE™ technology enables low-cost production of periodic structures over large-areas with a non-contact exposure system. Eulitha also offers solutions based on state-of-the-art e-beam and EUV-IL lithography technologies.
Unique full-field exposure system for non-contact patterning of wafers
Large-area nano patterns made by PHABLE™ and E-beam
Made by E-beam, PHABLE™ and other lithography technologies
Gratings on thin membranes for lithography and spectroscopy
At this year’s International Conference on Nitride Semiconductors, being held in Washington, USA between July 7-12, a number of works are going to be...
We are looking forward to showcasing the latest advancements in our PhableR series photolithography systems this July.
Eulitha exhibited at CLEO 2019