Lithography systems
Unique full-field nanolithography exposure systems for non-contact patterning of wafers
Eulitha provides nano-patterning services and equipment for applications in photonics, electronics, optoelectronics, displays, biotechnology and other areas. Its proprietary PHABLE™ technology enables low-cost production of periodic structures over large-areas with a non-contact exposure system. Eulitha also offers solutions based on state-of-the-art e-beam and EUV-IL lithography technologies.
Unique full-field nanolithography exposure systems for non-contact patterning of wafers
Large-area nano patterns made by PHABLE™ and E-beam
Made by E-beam, PHABLE™ and other lithography technologies
Gratings on thin membranes for lithography and spectroscopy
Eulitha AG has participated in the 23rd China International Optoelectronic Exposition (CIOE 2021), represented by Germantech, our partner in the...
The 47th International Conference on Micro & Nano Engineering took place in Turin, Italy between September 20-23, 2021
The event took place in China, Guangzhou between September 10-12, 2021