Next generation nano patterning

Eulitha provides nano-patterning services and equipment for applications in photonics, electronics, optoelectronics, displays, biotechnology and other areas. Its proprietary PHABLE™ technology enables low-cost production of periodic structures over large-areas with a non-contact exposure system.  Eulitha also offers solutions based on state-of-the-art e-beam and EUV-IL lithography technologies.

PSS NPSS equipment

PhableR 100

Unique full-field exposure system for non-contact patterning of wafers

euv gratings

EUV gratings

Gratings on thin membranes for lithography and spectroscopy

PhableR 100 - Revolutionary high resolution photolithography system

  • Full-field exposure on 4” wafers
  • Practically unlimited depth-of-focus
  • High resolution: 150nm half-pitch or below
  • Uniform printing on non-flat substrates (e.g. epi-wafers)
  • Non-contact: protects masks from damage and contamination
  • Linear gratings, photonic crystal patterns and other periodic structures
    Learn more about PhableR 100

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