PhableR 100
Unique full-field exposure system for non-contact patterning of wafers
Eulitha provides nano-patterning services and equipment for applications in photonics, electronics, optoelectronics, displays, biotechnology and other areas. Its proprietary PHABLE™ technology enables low-cost production of periodic structures over large-areas with a non-contact exposure system. Eulitha also offers solutions based on state-of-the-art e-beam and EUV-IL lithography technologies.
Unique full-field exposure system for non-contact patterning of wafers
Large-area nano patterns made by PHABLE™ and E-beam
Made by E-beam, PHABLE™ and other lithography technologies
Gratings on thin membranes for lithography and spectroscopy
The 45th International Conference on Micro & Nano Engineering took place in Rodos Palace Hotel, Rhodes Greece between September 23 - 26, 2019
The event took place in China, Shenzhen between September 4-7, 2019!
Our China distributor GermanTech presented our PhableR tool and technology at ChinaNANO 2019, an academic seminar of nano fabrication in Beijing,...