Lithography systems
Unique full-field nanolithography exposure systems for non-contact patterning of wafers
Eulitha provides nano-patterning services and equipment for applications in photonics, electronics, optoelectronics, displays, biotechnology and other areas. Its proprietary PHABLE™ technology enables low-cost production of periodic structures over large-areas with a non-contact exposure system. Eulitha also offers solutions based on state-of-the-art e-beam and EUV-IL lithography technologies.
Unique full-field nanolithography exposure systems for non-contact patterning of wafers
Large-area nano patterns made by PHABLE™ and E-beam
Made by E-beam, PHABLE™ and other lithography technologies
Gratings on thin membranes for lithography and spectroscopy
Our China distributor GermanTech presented our PhableR/PhableX tool and technology at CIOE 2020 on September 9-11, 2020 in Shenzhen, China.
Read our press release
Eulitha and GermanTech presented at Semicon China between June 27-29, 2020