Lithography systems
Unique full-field nanolithography exposure systems for non-contact patterning of wafers
Eulitha provides nano-patterning services and equipment for applications in photonics, electronics, optoelectronics, displays, biotechnology and other areas. Its proprietary PHABLE™ technology enables low-cost production of periodic structures over large-areas with a non-contact exposure system. Eulitha also offers solutions based on state-of-the-art e-beam and EUV-IL lithography technologies.
Unique full-field nanolithography exposure systems for non-contact patterning of wafers
Large-area nano patterns made by PHABLE™ and E-beam
Made by E-beam, PHABLE™ and other lithography technologies
Gratings on thin membranes for lithography and spectroscopy
The AWE ASIA event took place in The Anandi Hotel and Spa Shanghai
AGIC Capital invests into Switzerland-based Eulitha, a leading provider of non-contact Nano-UV-Lithography equipment and services.
AGIC Capital will...
The 48th International Conference on Micro & Nano Engineering takes place in Leuven, Belgium between September 19-23, 2022