Lithography for photonics

Eulitha provides nano-patterning services and equipment for applications in photonics, electronics, optoelectronics, displays, biotechnology and other areas. Its proprietary PHABLE™ technology enables low-cost production of periodic structures over large-areas with a non-contact exposure system. Eulitha also offers solutions based on state-of-the-art e-beam and EUV-IL lithography technologies.

PhableR 100

Unique full-field exposure system for non-contact patterning of wafers

Standard Patterns

Large-area nano patterns made by PHABLE™ and E-beam

Custom nano-patterning

Made by E-beam, PHABLE™ and other lithography technologies

EUV gratings

Gratings on thin membranes for lithography and spectroscopy

PhableR 100 - Revolutionary high resolution photolithography system

Full-field exposure on 4” wafers
Practically unlimited depth-of-focus
High resolution: 150nm half-pitch or below
Uniform printing on non-flat substrates (e.g. epi-wafers)
Non-contact: protects masks from damage and contamination
Linear gratings, photonic crystal patterns and other periodic structures
Learn more about PhableR 100

News And Upcoming Events

08/20/2019

Eulitha exhibited on ChinaNANO 2019

Our China distributor GermanTech presented our PhableR tool and technology at ChinaNANO 2019, an academic seminar of nano fabrication in Beijing,...

07/24/2019

Eulitha exhibits at CIOE 2019 in Shenzhen, China

Please visit us at Booth No. 2509 between September 4-7, 2019 in Shenzhen Convention & Exhibition Center!

06/27/2019

Scientific presentations using PhableR lithography tools at ICNS 13

At this year’s International Conference on Nitride Semiconductors, being held in Washington, USA between July 7-12, a number of works are going to be...