DTL Article published on Nature


Displacement Talbot Lithography article featured on the front page of Nature Microsystems & Nanoengineering


Researchers from University of Bath, together with collaborators from France and Germany have published an article titled "Displacement Talbot lithography for nanoengineering of III-nitride materials" in the Nature Microsystems & Nanoengineering journal. The article featured on the front page of the journal reports "on the use of a fast, robust and flexible emerging patterning technique called Displacement Talbot lithography (DTL), to successfully nano-engineer III-nitride materials." The authors conclude "These results, achieved on a wafer scale via DTL and upscalable to larger surfaces, have the potential to unlock the manufacturing of nano-engineered III-nitride materials." The results were obtained on a PhableR 100 system from Eulitha.




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