Eulitha presented the PHABLE Technology at SPIE
Eulitha attended the SPIE Advanced Lithography conference in San Jose, USA, 23–27 February 2014 and presented its PHABLE Technology
Eulitha attended the SPIE Advanced Lithography conference in San Jose, USA, 23–27 February 2014 and presented its PHABLE Technology
Eulitha and Kyodo exhibited at NanoTech show in Tokyo, January 29-31, 2014
The PhableR 100 system is based on Eulitha's proprietary PHABLE photolithographic technology, which makes it possible to print high- resolution...
Eulitha collaborator EVGroup introduces EVG PHABLE system for volume production of photonic components.
Eulitha exhibited at 12th International Conference on Nanoimprint & Nanoprint Technology, October 21-23, 2013, Barcelona, Spain.
Eulitha attends SPIE Optics and Photonics Exhibit. Aug 27-29, 2013, San Diego, USA.
Eulitha is awarded the CTI-Label for sustainable growth by the Swiss CTI Startup program
Eulitha exhibited at the 57th EIPBN conference, May 28-31, 2013, Nashville, USA.
Press release of Jan 27, 2011
Transmission diffraction gratings are required in many research and development projects such as characterization of EUV light sources or spectroscopy...