Technical articles

High-aspect ratio silicon structures by displacement Talbot lithography and Bosch etching

Konstantins Jefimovs et al, Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101460L, (2017).

High rotational symmetry photonic structures fabricated with multiple exposure Displacement Talbot Lithography

Christian Dais, Francis Clube, Li Wang, Harun H. Solak, Microelectronic Engineering, Volume 177, 9-12, (2017).

High-resolution, high-aspect-ratio iridium–nickel composite nanoimprint molds

Chang-Sheng Lee et al, J. Vac. Sci. Technol. B 34, 061804 (2016).

RAITH and EULITHA Issue New Application Note

Efficient volume production of periodic nanostructures using
Raith EBPG Electron Beam Lithography System and Eulitha PHABLE Technology
Harun Solak, Rene Wilde, Dirk Brüggemann (2016)

Sub-wavelength printing in the deep ultra-violet region using Displacement Talbot Lithography

Li Wang, Francis Clube, Christian Dais, Harun H. Solak, Jens Gobrecht, Microelectronic Engineering, Volume 161, 104–108, (2016).

Phase shifting masks in Displacement Talbot Lithography for printing nano-grids and periodic motifs

Harun H. Solak, Christian Dais, Francis Clube, Li Wang, Microelectronic Engineering, Volume 143, 74–80, (2015).

Displacement Talbot Lithography for Micro and Nano-patterning of LED Substrates

F. Clube et al, 39th International Conference on Micro and Nano Engineering 16 – 19 September 2013, London, UK.

Manufacturing photonic LEDs with photolithography

Featured Article in Compound Semiconductor, November/December, Vol. 16, No. 8, p.33 (2010).

New Optical Lithography Method for Advanced Light Extraction in LEDs

Review Article in LED Professional May/June 2013 issue

Fabrication of phase shifting masks with nanoimprint lithography for PHABLETM photolithography

C. Dais et al, The 12th International Conference on Nanoimprint & Nanoprint Technology, October 21-23, 2013, Barcelona, Spain.