Using EULITHA AG Displacement Talbot Lithography (DTL) technology provided at Lund Nano Lab, it is possible to produce critical feature sizes down to 60 nm with a DUV light source. We can go even further by employing AlixLabs proprietary APS technology, aiming at below 10 nm feature size. AlixLabs is now steaming ahead, expanding activities in Lund and Dresden in 2023, and Yoana Ilarionova and Asif Hassan have some busy days processing silicon wafers in the Lund Nanolabs Lithography cleanroom!

Read more about the Eulitha DUV DTL tool at Lund Nano Lab in this press release:

Information on Eulitha Lithography systems: