Lithography for photonics

Eulitha provides nano-patterning services and equipment for applications in photonics, electronics, optoelectronics, displays, biotechnology and other areas. Its proprietary PHABLE™ technology enables low-cost production of periodic structures over large-areas with a non-contact exposure system.  Eulitha also offers solutions based on state-of-the-art e-beam and EUV-IL lithography technologies.

PSS NPSS equipment

Lithography systems

Unique full-field nanolithography exposure systems for non-contact patterning of wafers

euv gratings

EUV gratings

Gratings on thin membranes for lithography and spectroscopy

PhableX – Photolithography system for volume production of photonics

  • Full-field exposure on 100-200mm wafers
  • Practically unlimited depth-of-focus
  • High resolution: down to 60nm half-pitch
  • Uniform printing on non-flat substrates (e.g. AR waveguides)
  • Automatic wafer-handling and overlay alignment

Learn more about PhableX

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