Lithography systems
Unique full-field nanolithography exposure systems for non-contact patterning of wafers
Eulitha provides nano-patterning services and equipment for applications in photonics, electronics, optoelectronics, displays, biotechnology and other areas. Its proprietary PHABLE™ technology enables low-cost production of periodic structures over large-areas with a non-contact exposure system. Eulitha also offers solutions based on state-of-the-art e-beam and EUV-IL lithography technologies.
Unique full-field nanolithography exposure systems for non-contact patterning of wafers
Large-area nano patterns made by PHABLE™ and E-beam
Made by E-beam, PHABLE™ and other lithography technologies
Gratings on thin membranes for lithography and spectroscopy
Visit our Booth #537
EULITHA successfully exhibited a waveguide based Head Up Display (HUD) prototype designed by Dispelix and fabricated using EULITHA's Displacement...
EULITHA's patented DTL technology will continue to enable low cost, high quality, high throughput lithography for photonics solutions.
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