Lithography for photonics

Eulitha provides nano-patterning services and equipment for applications in photonics, electronics, optoelectronics, displays, biotechnology and other areas. Its proprietary PHABLE™ technology enables low-cost production of periodic structures over large-areas with a non-contact exposure system.  Eulitha also offers solutions based on state-of-the-art e-beam and EUV-IL lithography technologies.

PSS NPSS equipment

PhableR 100

Unique full-field exposure system for non-contact patterning of wafers

euv gratings

EUV gratings

Gratings on thin membranes for lithography and spectroscopy

PhableR 100 - Revolutionary high resolution photolithography system

  • Full-field exposure on 4” wafers
  • Practically unlimited depth-of-focus
  • High resolution: 150nm half-pitch or below
  • Uniform printing on non-flat substrates (e.g. epi-wafers)
  • Non-contact: protects masks from damage and contamination
  • Linear gratings, photonic crystal patterns and other periodic structures
    Learn more about PhableR 100

News And Upcoming Events


Eulitha exhibited on ChinaNANO 2019

Our China distributor GermanTech presented our PhableR tool and technology at ChinaNANO 2019, an academic seminar of nano fabrication in Beijing,...