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PHABLE tools, based on Eulitha's proprietary Displacement Talbot Lithography (DTL) technology, offer unparalleled high-resolution printing with a low-cost photolithography system. They overcome the limitations of diffraction in conventional lithography, enabling the printing of sub-micron periodic patterns with excellent quality. The non-contact exposures protect both the mask and wafer, while the patented focus-free imaging allows uniform printing on non-flat substrates and in thick resists.

The PhableX tool provides unprecedented ability to print high resolution periodic structures in a low-cost photolithography system. It is similar to a conventional mask-aligner where a photoresist coated wafer is put in proximity to a mask and exposed by a beam of UV light, but thanks to the breakthrough PHABLE exposure technology of Eulitha the resolution is no longer limited by undesired diffraction effects.

Structures such as sub-micron period linear gratings and 2D patterns such as hexagonal and square lattices are printed with high uniformity and fidelity.

The applications are almost unlimited including:

  • XR (AR/VR/MR)
More on PhableX.

To learn more about the product, download the flyer below

Hexagonal lattice 1,5μm pillars, 3,0μm period
Hexagonal lattice 100nm holes, 600nm period
Hexagonal lattice 300nm pillars, 600nm period
Linear grating 50nm lines, 140nm period
Rhombic lattice 200nm holes, 400nm period
Square holes 500nm holes, 1000nm period
Square lattice 200nm holes, 400nm periodl
Variable fill-factor 300nm period
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