Eulitha offers e-beam patterning services to academic and industrial customers for either direct use in experiments and devices or for production of replication templates. Typical production cycle involves the following steps:
1. Specification of customer requirements, e.g. substrate, pattern layout, resolution, feature height and profile
2. Proposal from Eulitha including alternative approaches in consideration of quality, cost and manufacturability
3. Transfer of substrates and layout files (if applicable) from customer to Eulitha
4. Pattern realization through ebeam exposure including any pattern transfer steps, e.g. etching
5. Characterization (e.g. SEM, optical microscopy)
EULITHA has developed an efficient process for fabricating unique nanohole and pillar arrays over areas that were considered too large to be affordable until now.
Nanoholes formed with the newly developed process are etched into silicon substrates up to an aspect ratio (depth/diameter ratio) of 3. The period of the nanohole patterns is freely adjustable to anywhere between 70 nm to tens of microns. Nanopillars can have pitch down to 100 nm and height up to 200nm. Fields of application for the new nano arrays include patterned epitaxial growth substrates, magnetic nanostructures, nanoparticle production, biology, molecular self assembly and nanoimprint processes.
Download our brochure on large area nano hole and pillar arrays
